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Volumn 31, Issue 3, 2000, Pages 199-205

On the design and fabrication of novel Lateral Bipolar Transistor in a deep-submicron technology

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MOSFET DEVICES; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY;

EID: 0343192440     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(99)00134-2     Document Type: Article
Times cited : (6)

References (19)
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    • (1983) IEEE J. Solid-State Circuits , vol.18 , Issue.3 , pp. 273-279
    • Vittoz, E.A.1
  • 5
    • 0022769889 scopus 로고
    • Half-micrometre-base lateral bipolar transistors made in thin silicon-on-insulator films
    • Colinge J.P. Half-micrometre-base lateral bipolar transistors made in thin silicon-on-insulator films. Electron. Lett. 22:(17):1986;886-887.
    • (1986) Electron. Lett. , vol.22 , Issue.17 , pp. 886-887
    • Colinge, J.P.1
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    • 0023330767 scopus 로고
    • An SOI voltage-controlled bipolar-MOS device
    • Colinge J.P. An SOI voltage-controlled bipolar-MOS device. IEEE Trans. Electron. Devices. 34:(4):1987;845-849.
    • (1987) IEEE Trans. Electron. Devices , vol.34 , Issue.4 , pp. 845-849
    • Colinge, J.P.1
  • 8
    • 0023315140 scopus 로고
    • Lateral silicon-on-insulator bipolar transistor with a self-aligned base contact
    • Sturm J.C., McVittie J.P., Gibbons J.F., Pfeiffer L. Lateral silicon-on-insulator bipolar transistor with a self-aligned base contact. IEEE Electron. Device Lett. 8:(3):1987;104-106.
    • (1987) IEEE Electron. Device Lett. , vol.8 , Issue.3 , pp. 104-106
    • Sturm, J.C.1    McVittie, J.P.2    Gibbons, J.F.3    Pfeiffer, L.4
  • 13
    • 0027641179 scopus 로고
    • Very high current gain enhancement by substrate biasing of lateral bipolar transistors on thin SOI
    • Edholm B., Olsson J., Soderbarg A. Very high current gain enhancement by substrate biasing of lateral bipolar transistors on thin SOI. Microelectron. Engng. 22:(1-4):1993;379-382.
    • (1993) Microelectron. Engng , vol.22 , Issue.14 , pp. 379-382
    • Edholm, B.1    Olsson, J.2    Soderbarg, A.3
  • 16
    • 0024699918 scopus 로고
    • Selective oxidation using ultrathin nitrogen-rich silicon surface layers grown by rapid thermal processing
    • Paz de Araujo C.A., Huang Y.P., Gallegos R. Selective oxidation using ultrathin nitrogen-rich silicon surface layers grown by rapid thermal processing. J. Electrochem. Soc. 136:(7):1989;2035-2038.
    • (1989) J. Electrochem. Soc. , vol.136 , Issue.7 , pp. 2035-2038
    • Paz De Araujo, C.A.1    Huang, Y.P.2    Gallegos, R.3
  • 17
    • 0001524603 scopus 로고
    • Novel process for reliable ultrathin tunnel dielectrics
    • Hao M.-Y., Maiti B., Lee J.C. Novel process for reliable ultrathin tunnel dielectrics. Appl. Phys. Lett. 64:(16):1994;2102-2104.
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.16 , pp. 2102-2104
    • Hao, M.-Y.1    Maiti, B.2    Lee, J.C.3
  • 18
    • 0030172206 scopus 로고    scopus 로고
    • Elimination of the sidewall defects in selective epitaxial growth (SEG) of silicon for a dielectric isolation technology
    • Sherman J.M., Neudeck G.W., Denton J.P., Bashir R., Fultz W.W. Elimination of the sidewall defects in selective epitaxial growth (SEG) of silicon for a dielectric isolation technology. IEEE Electron. Device Lett. 17:(6):1996;267-269.
    • (1996) IEEE Electron. Device Lett. , vol.17 , Issue.6 , pp. 267-269
    • Sherman, J.M.1    Neudeck, G.W.2    Denton, J.P.3    Bashir, R.4    Fultz, W.W.5
  • 19
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    • Kasper E. London: IEE-INSPEC
    • Properties of strained and relaxed silicon-germanium. Kasper E. EMIS Data Reviews Series. 12:1995;IEE-INSPEC, London.
    • (1995) EMIS Data Reviews Series , vol.12


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.