Sensitive, nonintrusive, in-situ measurement of temporally and spatially resolved plasma electric fields

Physical Review Letters

Volumn 52, Issue 7, 1984, Pages 538-541

  Moore, Cameron A ^a,b   Davis, Glenn P ^a,c   Gottscho, Richard A ^a,d  

^a LUCENT TECHNOLOGIES   (United States)

^b Department of Environmental and Radiological Health Sciences

^c Intercal Inc ^*

^d Author to Whom Correspondence Should Be Addressed ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343188863     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.52.538     Document Type: Article

References (13)

1. Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density
2. Summary Abstract: Laser-induced fluorescence diagnostics of glow discharges: Spatially resolved concentration profiles
3. Compensated Polarization Scrambler for Raman Depolarization and Intensity Measurements on Microsamples
4. On "Scrambler Plates" Used to Depolarize Visible Radiation
5. BAND SPECTRUM AND STRUCTURE OF THE BCl MOLECULE