Thermal bias annealing evidence for the defect pool in amorphous silicon thin-film transistors

Applied Physics Letters

Volumn 57, Issue 14, 1990, Pages 1416-1418

  Deane, S C ^a   Powell, M J ^a   Hughes, J R ^a   French, I D ^a   Milne, W I ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343132512     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.103452     Document Type: Article

References (7)