The importance of free radical recombination reactions in CF4 /02 plasma etching of silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 1648-1653

  Jensen, K F ^b  

^a UNIVERSITY OF MINNESOTA   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343116831     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576780     Document Type: Article

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