Ultraf ast transient bleaching of CdS nano-particles in various media

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3469, Issue , 1998, Pages 174-181

  Nagamura, Toshihiko ^a   Inoue, Hiroshi ^a   Sakaguchi, Hiroshi ^a   Grieser, Franz ^b   Urquhart, Robert ^c   Elliot, David J ^c   Neil Furlong, D ^c  

^a SHIZUOKA UNIVERSITY   (Japan)

^b UNIVERSITY OF MELBOURNE   (Australia)

^c CSIRO   (Australia)

Author keywords

CdS nanoparticles; Decay of excitons; Femtosecond laser excitation; Nafion film; Particle size; Recombination of surface trapped electron hole pairs; Self assembled film; Surface treatment; Transient photobleaching and recovery

Indexed keywords

BLEACHING; CADMIUM SULFIDE; CDS NANOPARTICLES; CLEANING; EXCITONS; FEMTOSECOND LASERS; FLUORESCENCE; II-VI SEMICONDUCTORS; LASER EXCITATION; ORGANIC-INORGANIC MATERIALS; PARTICLE SIZE; PHOTOBLEACHING; RECOVERY; RED SHIFT; SURFACE TREATMENT;

EXCITON ABSORPTIONS; NAFION FILM; RECOVERY PROCESS; SELF ASSEMBLED FILMS; SURFACE-TRAPPED ELECTRONS; TIME DEPENDENCE; ULTRA-FAST DYNAMICS; WAVELENGTH REGIONS;

SULFUR COMPOUNDS;

EID: 0343068631     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.312918     Document Type: Conference Paper

References (19)

1. Y. Wang, in D. C. Neckers, D. H. Volman and G. von Bünau (Eds), Advances in Photochemistry, John Wiley, New York, 19, pp. 179-234 (1995).
2. H. Weller, Adv. Mater., 5, pp. 88-95 (1993).
3. Y. Wang and N. Herron, J. Phys. Chem., 95, pp. 525-532 (1991).
4. P. V. Kamat and N. M. Dimitrijevic, J. Phys. Chem., 93, pp. 2873-2875 (1989).
5. P. V. Kamat, K. R. Gopidas and N. M. Dimitrijevic, Mol. Cryst. Liq. Cryst, 183, pp. 439-445 (1990).
6. A. V. Barzykin and M. A. Fox, Israel. J. Chem., 33, pp. 21-30 (1993).
7. A. P. Alivisatos, A. L. Harris, N. J. Levinos, M. L. Steigerwald and L. E. Brus, J. Chem. Phys., 89, pp. 4001-4011 (1988).
8. Y. Wang, A. Suna, J. McHugh, E. F. Hilinski, P. A. Lucas and R. D. Johnson, J. Chem. Phys., 92, pp. 6927-6939 (1990).
9. M. Kaschke, N. P. Ernsting, U. Miiller and H. Weller, Chem. Phys. Lett, 168, pp. 543-550 (1990).
10. J. Z. Zhang, R. H. O'Neil, T. W. Roberti, J. L. McGowen and J. E. Evans, Chem. Phys. Lett., 218, pp. 479-484 (1994).
11. D. E. Skinner, D. P. Colombo, J. J. Cavaleri and R. M. Bowman, J. Phys. Chem., 99, pp. 7853-7856. (1995)
12. E. F. Hilinski, P. A. Lucas and Y. Wang, J. Chem. Phys., 89, pp. 3435-3441 (1988).
13. H. Inoue, R. Urquhart, T. Nagamura, F. Grieser, H. Sakaguchi, and D. N. Furlong, Colloids and Surfaces A: Physicochem. Eng. Aspects, 126, pp. 197-208 (1997).
14. I. Ichinose, N. Kimizuka, and T. Kunitake, J. Phys. Chem. 99, pp. 3736-3742 (1995).
15. L. Spanhel, M. Haase, H. Weller and A. Henglein, J. Am. Chem. Soc, 109, pp. 5649-5655 (1987).
16. T. Nagamura, H. Sakaguchi, and S. Muta, Proc. SPIE, 2514, pp. 241-248 (1995).
17. J. P. Kuczynski, B. H. Milosavljevic and J. K. Thomas, J. Phys. Chem., 88, pp. 980-984 (1984).
18. A. Henglein, Chem. Rev., 89, pp. 1861-1873 (1989).
19. J. Z. Zhang, R. H. O'Neil and T. W. Roberti, J. Phys. Chem., 98, pp. 3859-3864 (1994).