-
5
-
-
21544466840
-
-
R. C. Powell, N. E. Lee, Y. W. Kim, and J. E. Greene, J. Appl. Phys. 73, 189 (1993).
-
(1993)
J. Appl. Phys.
, vol.73
, pp. 189
-
-
Powell, R.C.1
Lee, N.E.2
Kim, Y.W.3
Greene, J.E.4
-
6
-
-
21544441360
-
-
M. E. Lin, B. Sverdlov, G. L. Zhou, and H. Morkoç, Appl. Phys. Lett. 62, 3479 (1993).
-
(1993)
Appl. Phys. Lett.
, vol.62
, pp. 3479
-
-
Lin, M.E.1
Sverdlov, B.2
Zhou, G.L.3
Morkoç, H.4
-
7
-
-
0029307273
-
-
A. Ohtani, K. S. Stevens, M. Kinniburgh, and R. Beresford, J. Cryst. Growth 150, 902 (1995).
-
(1995)
J. Cryst. Growth
, vol.150
, pp. 902
-
-
Ohtani, A.1
Stevens, K.S.2
Kinniburgh, M.3
Beresford, R.4
-
8
-
-
0029275339
-
-
R. Beresford, A. Ohtani, K. S. Stevens, and M. Kinniburgh, J. Vac. Sci. Technol. B 13, 792 (1995).
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 792
-
-
Beresford, R.1
Ohtani, A.2
Stevens, K.S.3
Kinniburgh, M.4
-
9
-
-
4243079368
-
-
Y. Ino, M. Sasaki, and K. Numajiri, Semicond. World 1, 73 (1985). We were unable to locate the original publication - the data cited is reprinted in M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992), p. 72.
-
(1985)
Semicond. World
, vol.1
, pp. 73
-
-
Ino, Y.1
Sasaki, M.2
Numajiri, K.3
-
10
-
-
0003931431
-
-
Springer, New York
-
Y. Ino, M. Sasaki, and K. Numajiri, Semicond. World 1, 73 (1985). We were unable to locate the original publication - the data cited is reprinted in M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992), p. 72.
-
(1992)
Film Deposition by Plasma Techniques
, pp. 72
-
-
Konuma, M.1
-
11
-
-
0000210963
-
-
T. Ono, M. Oda, C. Takahashi, and S. Matsuo, J. Vac. Sci. Technol. B 4, 696 (1986).
-
(1986)
J. Vac. Sci. Technol. B
, vol.4
, pp. 696
-
-
Ono, T.1
Oda, M.2
Takahashi, C.3
Matsuo, S.4
-
14
-
-
4243127757
-
-
W. E. Köhler, M. Römheld, R. J. Seeböck, and S. Skaberna, Appl. Phys. Lett. 63, 2890 (1993).
-
(1993)
Appl. Phys. Lett.
, vol.63
, pp. 2890
-
-
Köhler, W.E.1
Römheld, M.2
Seeböck, R.J.3
Skaberna, S.4
-
16
-
-
4243150283
-
-
edited by M. Moisan and J. Pelletier Elsevier, New York
-
J. Pelletier, Y. Arnal, and M. Moisan, in Microwave Excited Plasmas, edited by M. Moisan and J. Pelletier (Elsevier, New York, 1992), pp. 250-252.
-
(1992)
Microwave Excited Plasmas
, pp. 250-252
-
-
Pelletier, J.1
Arnal, Y.2
Moisan, M.3
-
17
-
-
4243095707
-
-
edited by R. H. Huddlestone and S. L. Leonard Academic, New York
-
F. F. Chen, in Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965), pp. 164-168.
-
(1965)
Plasma Diagnostic Techniques
, pp. 164-168
-
-
Chen, F.F.1
-
20
-
-
0004153355
-
-
NSRDS-NBS 26 USGPO, Washington
-
J. K. Franklin, J. C. Dillard, H. M. Rosenstock, J. T. Herron, K. Draxl, and F. H. Field, Ionization Potentials, Appearance Potentials, and Heats of Gaseous Positive Ions, NSRDS-NBS 26 (USGPO, Washington, 1989).
-
(1989)
Ionization Potentials, Appearance Potentials, and Heats of Gaseous Positive Ions
-
-
Franklin, J.K.1
Dillard, J.C.2
Rosenstock, H.M.3
Herron, J.T.4
Draxl, K.5
Field, F.H.6
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