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Volumn 79, Issue 3, 1996, Pages 1292-1297

Downstream ion drift in an electron cyclotron resonance plasma process

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0343040357     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361024     Document Type: Article
Times cited : (8)

References (20)
  • 9
    • 4243079368 scopus 로고
    • Y. Ino, M. Sasaki, and K. Numajiri, Semicond. World 1, 73 (1985). We were unable to locate the original publication - the data cited is reprinted in M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992), p. 72.
    • (1985) Semicond. World , vol.1 , pp. 73
    • Ino, Y.1    Sasaki, M.2    Numajiri, K.3
  • 10
    • 0003931431 scopus 로고
    • Springer, New York
    • Y. Ino, M. Sasaki, and K. Numajiri, Semicond. World 1, 73 (1985). We were unable to locate the original publication - the data cited is reprinted in M. Konuma, Film Deposition by Plasma Techniques (Springer, New York, 1992), p. 72.
    • (1992) Film Deposition by Plasma Techniques , pp. 72
    • Konuma, M.1
  • 16
    • 4243150283 scopus 로고
    • edited by M. Moisan and J. Pelletier Elsevier, New York
    • J. Pelletier, Y. Arnal, and M. Moisan, in Microwave Excited Plasmas, edited by M. Moisan and J. Pelletier (Elsevier, New York, 1992), pp. 250-252.
    • (1992) Microwave Excited Plasmas , pp. 250-252
    • Pelletier, J.1    Arnal, Y.2    Moisan, M.3
  • 17
    • 4243095707 scopus 로고
    • edited by R. H. Huddlestone and S. L. Leonard Academic, New York
    • F. F. Chen, in Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965), pp. 164-168.
    • (1965) Plasma Diagnostic Techniques , pp. 164-168
    • Chen, F.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.