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Volumn 56, Issue 2-3, 1998, Pages 223-227

In-situ growth monitoring during PLD of oxides using RHEED at high oxygen pressure

Author keywords

Epitaxial growth; Oxides; PLD; RHEED; Surface treatment

Indexed keywords


EID: 0342984271     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(98)00235-9     Document Type: Article
Times cited : (14)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.