Diffusional deposition of colloidal particles: Electrostatic interaction and size polydispersity effects

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 165, Issue 1-3, 2000, Pages 79-93

  Semmler, Micha ^a,b   Rička, Jaroslav ^b   Borkovec, Michal ^c  

^a ETH ZURICH   (Switzerland)

^b UNIVERSITY OF BERN   (Switzerland)

^c Clarkson University   (United States)

Author keywords

Amidine latex; Atomic force microscopy; Diffusional deposition; Electrostatic interactions; Polydispersity; Random sequential adsorption

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; DEPOSITION; ELECTROSTATICS; IONIC STRENGTH; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS;

POLYDISPERSITY; RANDOM SEQUENTIAL ADSORPTION (RSA);

COLLOIDS;

AMIDINE; LATEX;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; COLLOID; COMPUTER SIMULATION; DISPERSION; IONIC STRENGTH; MOLECULAR INTERACTION; PARTICLE SIZE; PRIORITY JOURNAL;

EID: 0342980348     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(99)00438-0     Document Type: Article

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