메뉴 건너뛰기




Volumn 375, Issue 1-2, 2000, Pages 271-274

Epitaxial growth characteristics of oxide thin films prepared by pulsed laser deposition

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; CRYSTAL LATTICES; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; FILM PREPARATION; LASER ABLATION; OXYGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SILICON; THIN FILMS;

EID: 0342973148     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01237-2     Document Type: Article
Times cited : (6)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.