Reactive processes of nickel oxide on oxidic substrates as observed by scanning force microscopy

Crystal Research and Technology

Volumn 35, Issue 3, 2000, Pages 299-306

  Zollner M ^b   Kipp, S ^b   Becker, Klaus Dieter ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION IN SOLIDS; HIGH TEMPERATURE PROPERTIES; METALLIC FILMS; MICROSCOPIC EXAMINATION; QUARTZ; SILICA; SPUTTERING; SURFACE PHENOMENA; YTTRIUM; ZIRCONIA;

NICKEL OXIDE; SCANNING FORCE MICROSCOPY; YTTRIUM STABILIZED ZIRCON DIOXIDE;

NICKEL COMPOUNDS;

EID: 0342955767     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4079(200003)35:3<299::AID-CRAT299>3.0.CO;2-I     Document Type: Article

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