Deposition kinetics of Al2O3 from AlCl3-CO2-H2-HCl gas mixtures by thermal CVD in a hot-wall reactor

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Schierling, M ^a   Zimmermann, E ^a   Neuschutz D ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b Vacuumschmelze GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CARBON DIOXIDE; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; GASES; HYDROGEN; MIXTURES; NUMERICAL METHODS; PRESSURE EFFECTS; REACTION KINETICS; THERMAL EFFECTS;

DEPOSITION KINETICS; HOT WALL REACTOR; THERMAL CHEMICAL VAPOR DEPOSITION; THERMOBALANCE;

ALUMINA;

EID: 0342955021     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999811     Document Type: Article

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