In-situ monitoring of atmospheric pressure tin oxide CVD using coherent anti-Stokes Raman scattering

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Davis, M J ^a   Pemble, M E ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FREE RADICALS; GLASS; NEODYMIUM LASERS; ORGANIC COMPOUNDS; OXYGEN; PRESSURE; RAMAN SCATTERING; TEMPERATURE; TIN COMPOUNDS; WATER;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; COHERENT ANTI STOKES RAMAN SCATTERING; TIN OXIDE; VIBRATION ROTATION STRUCTURE;

METALLIC FILMS;

EID: 0342955020     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999806     Document Type: Article

References (9)

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