Structure design and fabrication of symmetric force-balance micromachining capacitive accelerometer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3223, Issue , 1997, Pages 284-293

  Qiang, Zou ^a   Deren, Lu ^a   Baoqing, Li ^a   Xingguo, Xiong ^a   Bin, Xiong ^a   Weiyuan, Wang ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Accelerometer; Maskless anisotropic etching; Micromachining

Indexed keywords

ACCELEROMETERS; ANISOTROPY; COMPOSITE MICROMECHANICS; DAMPING; ETCHING; MACHINING; MECHANISMS; MICROANALYSIS; MICROFABRICATION; MICROMACHINING; RESONANCE; STRUCTURAL DESIGN;

BALANCE MEASUREMENTS; BEAM STRUCTURES; BULK-MICROMACHINING; CAPACITIVE ACCELEROMETERS; DAMPING RATIOS; DYNAMIC PERFORMANCES; ETCHING CHARACTERISTICS; FIGURE OF MERITS; MASKLESS ANISOTROPIC ETCHING; RESONANCE FREQUENCIES; STATIC CHARACTERISTICS; STRUCTURE DESIGNS; STRUCTURE PARAMETERS;

ANISOTROPIC ETCHING;

EID: 0342936971     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284492     Document Type: Conference Paper

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