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Volumn 92-93, Issue , 1999, Pages 112-117

Carbothermal reduction and nitridation of silica: nuclei planar growth controlled by silicon monoxide diffusion on the reducer surface

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL VARIABLES CONTROL; DIFFUSION IN SOLIDS; GROWTH (MATERIALS); MICROSCOPIC EXAMINATION; NITRIDING; REACTION KINETICS; REDUCTION; SILICON COMPOUNDS; SILICON NITRIDE; SURFACES; TEMPERATURE;

EID: 0342733523     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(99)00184-3     Document Type: Article
Times cited : (8)

References (24)
  • 3
    • 0342854716 scopus 로고
    • in: Vicenzini (Ed.) Amsterdam
    • V. Figusch et al., in: Vicenzini (Ed.) High Technology Ceramics, Amsterdam, 1987, p. 517.
    • (1987) High Technology Ceramics , pp. 517
    • Figusch, V.1
  • 15
    • 0342694661 scopus 로고
    • Ph.D. Thesis, Universidade de Aveiro
    • F.L. e Silva, Ph.D. Thesis, Universidade de Aveiro, 1995.
    • (1995)
    • F.L. E. Silva1
  • 19
    • 0342694658 scopus 로고
    • in: P. Riley (Ed.), Leiden
    • M. Billy, Nitrogen Ceramics, in: P. Riley (Ed.), Leiden, 1977, p. 200.
    • (1977) Nitrogen Ceramics , pp. 200
    • Billy, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.