Comparison of Cl2 and F2 based chemistries for the inductively coupled plasma etching of NiMnSb thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1326-1330

  Hong, J ^a   Caballero, J A ^a   Lambers, E S ^a   Childress, J R ^b   Pearton, S J ^a  

^a University of Florida   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342563803     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581815     Document Type: Article

References (12)

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