Manufacturing pinhole arrays for X-ray source diagnostics using LIGA

Microsystem Technologies

Volumn 4, Issue 4, 1998, Pages 184-186

  Gerner, M ^a   Holldack, K ^a   Luttge R ^b   Schmidt, M ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342563242     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050127     Document Type: Article

References (4)

1. Hofman A; Méot F: (1982) Optical resolution of beam cross-section measurement by means of synchrotron radiation, Nucl. Instr. Meth. 203: 483-493
2. Renner T; Padmore HA; Keller R: (1995) Design and performance of the ALS diagnostic beamline, LBL-37638, Lawrence Berkeley Laboratory
3. Feiertag G et al.: (1996) Accuracy of deep X-ray lithography at the BESSY wavelength shifter, BESSY annual report 1996: 92-96
4. Holldack K; Paetman WB: (1996) A pinhole-array X-ray electron beam monitor, BESSY Technical Report TB AS 1/96