Incremental permeability and magnetoimpedance effect in mumetal film annealed by using rapid temperature annealing technique

Thin Solid Films

Volumn 375, Issue 1-2, 2000, Pages 51-54

  Cho, Wan Shik ^a   Lee, Heebok ^b   Kim, Chong Oh ^a  

^a Chungnam National University   (South Korea)

^b Kongju National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC ANISOTROPY; MAGNETIC PERMEABILITY; MAGNETOELECTRIC EFFECTS; MAGNETORESISTANCE; NICKEL COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

MAGNETOIMPEDANCE RATIO (MIR0; TRANSVERSE INCREAMENTAL PERMEABILITY RATIO (TPR);

MAGNETIC THIN FILMS;

EID: 0342538901     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01179-2     Document Type: Article

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