Morphological instability and Si diffusion in nanoscale cobalt silicide films formed on heavily phosphorus doped polycrystalline silicon

Applied Physics Letters

Volumn 63, Issue 14, 1993, Pages 1933-1935

  Pramanick, S ^a   Erokhin, Yu N ^a   Patnaik, B K ^a   Rozgonyi, G A ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342538837     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.110804     Document Type: Article

References (0)