Reduced lateral straggling of implantation induced defects in III/V heterostructures by ion implantation along channeling directions

Applied Physics Letters

Volumn 68, Issue 1, 1996, Pages 102-104

  Kieslich, A ^a   Doleschel, H ^a   Kieseling, F ^a   Reithmaier, J P ^a   Forchel, A ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342529327     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116769     Document Type: Article

References (11)

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