Deposition rate as the key parameter in pulsed laser deposition of oxide films: a practical model and experiment

Physica C: Superconductivity and its Applications

Volumn 341-348 (IV), Issue , 2000, Pages 2349-2350

  Strikovski, Mikhail ^a   Miller Jr , John H ^a   Wosik, Jaroslaw ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; FILM GROWTH; MATHEMATICAL MODELS; OXIDE SUPERCONDUCTORS; PULSED LASER DEPOSITION; PYROLYSIS;

ADIABATIC THERMALIZATION; PLUME PULSE INTENSITY;

SUPERCONDUCTING FILMS;

EID: 0342527856     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4534(00)01085-6     Document Type: Article

References (5)

1. For example, see references in Pulsed Laser Deposition of Thin Films, edited by D. B. Chrisey, G. K. Hubler, (John Wiley & Sons, Inc., 1994)
2. T. Venkatesan, R. P. Sharma, Materials Science and Engineering, B41, 30 (1996)
3. W.K.A. Kumuduni, Y. Nakayama, Y. Nakata, T. Okada and M. Maeda, J. Appl. Phys. 74, 7510 (1993)
4. H. S. Kim and H. S. Kwok, Appl. Phys. Lett. 61, 2234 (1992)
5. M. Strikovski, J. Miller Jr., Appl. Phys. Lett. 73, 1733 (1998)