Magnetoresistance of La0.7Sr0.3MnO3 thin films obtained by magnetron sputtering on different substrates

Vacuum

Volumn 58, Issue 2, 2000, Pages 364-368

  Vlakhov, E S ^a,b   Dorr K ^c   Muller K H ^c   Nenkov, K A ^a,b,c   Handstein, A ^c   Donchev, T I ^d   Spasov, A Y ^d   Beshkov, G D ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b INTERNATIONAL LABORATORY OF HIGH MAGNETIC FIELDS AND LOW TEMPERATURES   (Poland)

^c IFW DRESDEN   (Germany)

^d INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE MEASUREMENT; MAGNETORESISTANCE; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

LATTICE MISMATCH;

LANTHANUM COMPOUNDS;

EID: 0342521373     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00192-5     Document Type: Article

References (5)

1. Vlakhov E.S., Chakalov R.A., Chakalova R.I., Nenkov K.A., Dörr K., Handstein A., Müller K.-H. J Appl Phys. 83:1998;2152-2157.
2. Balcells L.l., Fontcuberta J., Martinez B., Obradors X. Phys Rev B. 58:1998;R14697.
3. Fontcuberta J., Bibes M., Martinez B., Trtik V., Ferrater C., Sanchez F., Varela M. J Appl Phys. 85:1999;4800-4802.
4. Rao R.A., Lavric D., Nath T.K., Eom C.B., Wu L., Tsui F. Appl Phys Lett. 73:1998;3294-3296.
5. Vlakhov ES, Dörr K, Müller K-H, Handstein A, Nenkov KA, Walter T, Chakalov RA, Chakalova RI, Spasov AY. Acta Physica Polonika A 2000;97(1):2, in press.