Preparation and characterization of SiO2-MxOy(M = V, Sn, Sb) thin films from silicic acid and metal chlorides

Journal of Sol-Gel Science and Technology

Volumn 18, Issue 2, 2000, Pages 127-136

  Kaşgöz, Ahmet ^a   Abe, Yoshimoto ^b  

^a ISTANBUL UNIVERSITY   (Turkey)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; MOLECULAR STRUCTURE; SILICA; SOL-GELS; SOLUTIONS; THIN FILMS; X RAY DIFFRACTION;

METAL CHLORIDES; SILICIC ACID;

SEMICONDUCTING FILMS;

EID: 0342520866     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008712903021     Document Type: Article

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