New polishing method with magnetic congelation liquid

Journal of Intelligent Material Systems and Structures

Volumn 10, Issue 8, 1999, Pages 620-623

  Umehara, Noritsugu ^a   Shibata, Isao ^b   Edamura, Kazuya ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b NISCA Co Ltd   (Japan)

^c CEO of New Technology Management Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; COOLING; MAGNETIC FIELD EFFECTS; MAGNETIC FLUIDS; MOLDS; REMOVAL; SOLIDIFICATION; SURFACE ROUGHNESS;

MAGNETIC CONGELATION LIQUIDS;

CHEMICAL POLISHING;

EID: 0342519953     PISSN: 1045389X     EISSN: None     Source Type: Journal    
DOI: 10.1106/T2JN-4ANI-K7YF-RL3A     Document Type: Article

References (4)

1. Umehara, N., Annals of CIRP, Vol. 43, 1 (1994), 185-188.
2. Umehara, N. and Kato, K., Wear, 200 (1996) 148-153.
3. Umehara, N. and Suzuki, K. et al., The Annals of the CIRP, Vol. 46/1 (1997). 155-158.
4. Umehara, N. and Kawauchi, M., J. MMM, accepted for publication.