Defect production by the TEM beam - the first application of the positron microprobe

Applied Surface Science

Volumn 149, Issue 1, 1999, Pages 217-220

  Mannig U ^a   Bennewitz, K ^b   Bihr, H ^b   Haaks, M ^a   Sigle, W ^c   Zamponi, C ^a   Maier, K ^a  

^a UNIVERSITY OF BONN   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; ELECTRON IRRADIATION; POSITRONS; RADIATION DAMAGE; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

POSITRON MICROPROBES;

SURFACE STRUCTURE;

EID: 0342507822     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00204-4     Document Type: Article

References (8)

1. Patent specification 'Positronenquelle', submitted to DPA München.
2. Patent specification 'Positronenmikroskop', submitted to DPA München.
3. Greif H., Haaks M., Holzwarth U., Männig U., Tongbhoyai M., Maier K. Appl. Phys. Lett. 71:1997;15.
4. H. Greif, M. Haaks, U. Holzwarth, U. Männig, M. Tongbhoyai, K. Maier, ICPA-11, Kansas City, USA (1997).
5. J. Bihr, H. Greif, M. Haaks, U. Holzwarth, B. Huber, U. Männig, M. Tongbhoyai, K. Maier, Optik (1997), 106.
6. M. Haaks, U. Männig, U. Holzwarth, K. Maier, contribution to the Frühjahrstagung, Regensburg (1998).
7. Landold-Börnstein, New Series III/25.
8. R. Sizmann, J. Nucl. Mater. 69 & 70 (1968).