Progress in the gas sensitiveness of phthaloeyanine LB films

Chemistry Bulletin / Huaxue Tongbao

Volumn , Issue 11, 1996, Pages 5-9

  Ding, Hanming ^a   Li, Wei ^a   Wang, Haishui ^a   Xi, Shiquan ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342486895     PISSN: 04413776     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (28)

1. Van Oirschat Th G J, Van Leeuwen D, Medema J et al.,J. Electroanal. Chem, 1972, 37:373
2. Ukei K., Takamoto K. Phys. Lett., 1973, 45a: 4345
3. Kiselev V F et al. Phys. Status Solidi., 1977, K61: 429
4. Harrison S E. J. Chem. Phys., 1969, 50 4739
5. Day P, Price M G. J. Chem. Sec, 1969, A2: 236
6. Alexander A E. J. Chem. Soc, 1937, A2 1813
7. Baker S, Roberts G G, Petty M C Proc IEE. Part I,1983, 130 260
8. Wohltjen H, Barger W R, Snow A W et al. IEEE Trans.Electron Devices, 1985, 32 1170
9. Chinese Source
10. Snow A W, Barger W R, Klusty M et al. Langmuir,1986, 2(4): 513
11. Barger W R, Wohltjen H, Snow A W. Proc. IEE.Transducers, 1985: 410
12. Jones T A, Bott B. Proc. IEE. Transducers, 1985: 414
13. Nichagi K, Wargai K, Taomoto A et al. Thin Solid Films, 1989, 179: 297
14. Chinese Source
15. Wright J D. Progress in Surface Science, 1989, 31: 1
16. Chinese Source
17. Gu C Z, Sun L Y, Zhang T et al. Thin Solid Films,1994, 244: 909
18. Fu C W et al. Proc. IEE. Transducers, 1987: 583
19. Toyosaka M. Thin Solid Films, 1988, 160 413
20. Chinese Source
21. Iriyama K. Thin Solid Films, 1988, 160 413
22. Jing D P, Lu A D, Li Y J et al. Thin Solid Films, 1991,199: 173
23. Chinese Source
24. Sun L Y, Gu C Z et al. Thin Solid Films, 1992, 210 /211 486
25. Chinese Source
26. Dogo S, Germain J P, Maleysson C et al. Thin Solid Films, 1992, 219: 251
27. Wang H Y, Lando J B. Langmuir, 1994, 10 790
28. Archer P B M, Ghadwick A V, Miasik J J et al. Sens. Actuators, 1989, 16 379