Formation of Ti:sapphire thin films on single-crystal sapphire and GaAs substrates by pulsed laser deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2991, Issue , 1997, Pages 267-272

  Atanasov, Peter A ^a   Tomov, Rumen I ^a   Peshev, Zahari Y ^a   Dikovska, Anna O ^a   Tzaneva, Vassilka N ^a  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

Laser ablation; Laser plume; Thin films; Ti:sapphire

Indexed keywords

ABLATION; APPLICATIONS; CORUNDUM; DOPING (ADDITIVES); GALLIUM ALLOYS; LASER ABLATION; LASER APPLICATIONS; LASER PRODUCED PLASMAS; LASERS; PULSED LASER DEPOSITION; SAPPHIRE; SOLIDS; THIN FILMS;

EMISSION MEASUREMENTS; FILM QUALITIES; GAAS(001) SUBSTRATES; LASER DEPOSITIONS; LASER MEDIUMS; LASER PLUME; MONOCRYSTALLINE (MD); PLASMA PLUMES; POTENTIAL APPLICATIONS; TI:SAPPHIRE;

PULSED LASER APPLICATIONS;

EID: 0342466880     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.273735     Document Type: Conference Paper

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