Effect of thermal annealing on the optical properties of high-energy Cu-implanted silica glass

Journal of Non-Crystalline Solids

Volumn 275, Issue 1, 2000, Pages 65-71

  Pal, U ^a   Bautista Hernandez A ^a   Rodriguez Fernandez L ^b   Cheang Wong, J C ^b  

^a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; COMPOSITION EFFECTS; COPPER; HIGH TEMPERATURE EFFECTS; ION IMPLANTATION; LIGHT ABSORPTION; OPTICAL PROPERTIES; PARTICLES (PARTICULATE MATTER); PRECIPITATION (CHEMICAL); RUTHERFORD BACKSCATTERING SPECTROSCOPY;

FREE-ELECTRON THEORY; SURFACE PLASMON ABSORPTION;

FUSED SILICA;

EID: 0342409484     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00246-5     Document Type: Article

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