Low-voltage electron-beam lithography with scanning tunneling microscopy in air: A new method for producing structures with high aspect ratios

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 1327-1330

  Kragler, K ^a,b   Gunther E ^a   Leuschner, R ^a   Falk, G ^a   Von Seggern, H ^a   Saemann Ischenko, G ^b  

^a SIEMENS AG   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342396452     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589090     Document Type: Article

References (12)

1. S. C. Minne, H. T. Soh, Ph. Flueckiger, and C. F. Quate, Appl. Phys. Lett. 66, 703 (1995).
2. For a good overview, see Technology of Proximal Probe Lithography, edited by C. R. K. Martian (SPIE, Bellingham, WA, 1993).
3. K. Kragler, E. Günther, R. Leuschner, G. Falk, H. von Seggern, and G. Saemann-Ischenko, Thin Solid Films 264, 259 (1995).
4. K. Kragler, E. Günther, R. Leuschner, G. Falk, A. Hammerschmidt, H. von Seggern, and G. Saemann-Ischenko, Appl. Phys. Lett. 67, 1163 (1995).
5. R. Leuschner, M. Beyer, H. Borndörfer, E. Kühn, C. Nölscher, M. Sebald, and R. Sezi, Polym. Eng. Sci. 32, 1558 (1992).
6. R. Leuschner, E. Schmidt, H. Ohlmeyer, R. Sezi, and M. Irmscher, Microelectron. Eng. 27, 385 (1995).
7. See, for example, J. V. Crivello, Adv. Polym. Sci. 62, 1 (1984).
8. H. Ito, C. G. Willson, and J. M. J. Frechet, Proc. SPIE 771, 24 (1987).
9. For details of the deposition process, see Th. Mandel, M. Frischholz, R. Helbig, S. Birkle, and A. Hammerschmidt, Appl. Surf. Sci. 65/66, 795 (1993).
10. M. Sebald, R. Leuschner, R. Sezi, H. Ahne, and S. Birkle, Proc. SPIE 1262, 528 (1990).
11. R. Leuschner (unpublished).
12. M. A. McCord and R. F. W. Pease, J. Vac. Sci. Technol. B 6, 293 (1988).