Characterization of Ni80Fe20/Cu multilayers by X-ray reflection using anomalous scattering

Materials Science Forum

Volumn 321-324 I, Issue , 2000, Pages 451-456

  Meyer, D C ^a   Richter, K ^a   Wehner, B ^a   Reiss, G ^c   Van Loyen, L ^b   Paufler, P ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

^c BIELEFELD UNIVERSITY   (Germany)

Author keywords

Anomalous Scattering; Fluorescence EXAFS; Multilayer; X Ray Reflectometry

Indexed keywords

COPPER; DENSITY (SPECIFIC GRAVITY); ELECTROMAGNETIC WAVE REFLECTION; EMISSION SPECTROSCOPY; FLUORESCENCE; INTERFACES (MATERIALS); MAGNETORESISTANCE; NICKEL ALLOYS; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; X RAY SCATTERING; X RAY SPECTROSCOPY;

EXTENDED X RAY ABSORPTION FINE STRUCTURE (EXAFS) SPECTROSCOPY; GIANT MAGNETORESISTANCE (GMR); X RAY REFLECTOMETRY;

METALLIC SUPERLATTICES;

EID: 0342297951     PISSN: 02555476     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (7)

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