Optical characterisation of high-κ Materials deposited by ALCVD

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5133, Issue , 2003, Pages 316-321

  Bellandi, E ^a   Crivelli, B ^a   Elbaz, A ^a   Alessandri, M ^a   Boher, P ^b   Defranoux, C ^b  

^a STMICROELECTRONICS   (Italy)

^b SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); NONDESTRUCTIVE EXAMINATION; SURFACE ROUGHNESS; ZIRCONIA;

INTERFACE STATES;

SEMICONDUCTOR MATERIALS;

EID: 0242721633     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. C.M.Herzinger, B.Johs, W.A.McGahan, J.A.Woollam, W.Paulson, J.Appl.Phys., 83, 3323 (1998)
2. H.R.Philipp, in Handbook of optical constants of solids, edited by D.E.Palik (Academic, New York, 1985) p.749
3. V.Cosnier, H.Bender, M.Caymax, J.Chen, T.Conard, H.Nohira, O.Richard, W.Tsai, W.Vandervorst, E.Young, C.Zhao, S.DeGendt, M.Heyns, J.W.H.Maes, M.Tuominen, N.Rochat, M.Olivier, A.Chabli, Extended Abstracts of International Workshop on Gate Insulator (2001) IWGI 2001, Tokyo
4. A.G. Bruggeman, Ann. Phys. (Liepzig) 24, 636 (1935)