Electrochemical Deposition, Characterization and the Study of Giant Magnetoresistance of Cu/Co Superlattice Multilayer

Acta Physico - Chimica Sinica

Volumn 19, Issue 10, 2003, Pages 892-895

  Yao, Su Wei ^a   Zhao, Jin ^a   Wang, Hong Zhi ^a   Dong, Da Wei ^a  

^a TIANJIN UNIVERSITY   (China)

Author keywords

Electrodeposition; Giant magnetoresistance (GMR); Multilayer; Structure; Superlattice

Indexed keywords

COBALT; COPPER; SILICON;

ARTICLE; CHEMICAL STRUCTURE; ELECTROCHEMISTRY; MAGNET; MAGNETISM; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 0242720658     PISSN: 10006818     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

1. Baibich, M. N.; Broto, J. M.; Fert, A. Phys. Rev. Lett., 1988, 61 (21): 2472
2. Yukimi, J.; Satoshi, K.; Yasunori, H. J. Electrochem. Soc., 1997, 144 (1): 5
3. Srinivas, G.; Shin, S. C. J. Magn. Magn. Mater, 1999, 198: 341
4. Ho, E. M.; Petford-Long, A. K. J. Magn. Magn. Mater, 1996, 156 (1): 65
5. Pollard, R. J.; Wilson M. J.; Grundy, P. J. J. Magn. Magn. Mater, 1995, 146 (1): 11
6. Alper, M.; Attenborough, K.; Hart, R.; Lane, S. J. J. Appl. Phys. Lett., 1993, 63 (5): 2144
7. Xue, J. Y.; Wu, J. X.; Yang, D. J. Electrochem., 1997, 3 (4): 401 [(Dianhuaxue), 1977, 3 (4): 401]
8. Xue, J. Y.; Wu, J. X.; Yang, D. J. Electrochem., 1997, 3 (4): 401 [(Dianhuaxue), 1977, 3 (4): 401]
9. Xue, J. Y.; Wu, J. X.; Yang, D. J. Electrochem., 1996, 2 (3): 274 [(Dianhuaxue), 1996, 2 (3): 274]
10. Xue, J. Y.; Wu, J. X.; Yang, D. J. Electrochem., 1996, 2 (3): 274 [(Dianhuaxue), 1996, 2 (3): 274]
11. Zhou S. M. Metal electrodeposition. Shanghai: Shanghai Technical Press, 1982: 254
12. Lashwore, D. S.; Dariel, M. P. J. Electrochem. Soc., 1988, 135 (5): 1218