Exposure-Focus Critical Dimension Feedback Control in 300 mm Manufacturing Technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5044, Issue , 2003, Pages 83-89

  Narendra, Anju ^a   Carson, Steve ^a   Morrison, Cynthia ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; COST EFFECTIVENESS; FEEDBACK CONTROL; PERFORMANCE; PHOTOSENSITIVITY; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES;

PROCESS DRIFT; RUN TO RUN (RTR) CONTROL;

EXPOSURE CONTROLS;

EID: 0242609825     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485312     Document Type: Conference Paper

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