Material development and processing for electro-optic device systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4991, Issue , 2003, Pages 610-620

  Jin, Danlians ^a   Dinu, Raluca ^a   Parker, Timothy C ^a   Barklund, Anna ^a   Bintz, Lou ^a   Chen, Baoauan ^a   Flaherty, Christoph ^a   Guan, Hann Wen ^a   Huang, Diyun ^a   Kressbach, Jeffrey ^a   Londergan, Timothy ^a   Mino, Thomas D ^a   Todorova, Galina ^a   Yang, Simon ^a  

^a Lumera Corporation   (United States)

Author keywords

Hardmask; Low optical loss clads; Waveguide etching

Indexed keywords

CROSSLINKING; DRY ETCHING; ELECTRIC CONDUCTIVITY; LITHIUM NIOBATE; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; POLYMERS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

OPTICAL LOSS; POLYMER MODULATORS;

ELECTROOPTICAL DEVICES;

EID: 0242609186     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479448     Document Type: Conference Paper

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