Study of diffusion at surface of multilayered Cu/Au films on monocrystalline silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 213, Issue , 2004, Pages 519-522

  Benazzouz, C ^a   Benouattas, N ^b   Iaiche, S ^c   Bouabellou, A ^c  

^a CENTRE DE RECHERCHE NUCLÉAIRE D ALGER   (Algeria)

^b FERHAT ABBAS UNIVERSITY   (Algeria)

^c Universite Mentouri Constantine   (Algeria)

Author keywords

Backscattering spectrometry; Copper silicides; Gold; Morphology; Scanning electron microscopy; Silicon; X ray diffraction

Indexed keywords

COPPER COMPOUNDS; DIFFUSION; MULTILAYERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; THERMODYNAMICS; X RAY DIFFRACTION;

DIFFUSION BARRIERS; SOLID STATE REACTIONS;

CRYSTALLINE MATERIALS;

EID: 0242578358     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)01617-3     Document Type: Conference Paper

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