A Passively Mode-Locked Diode-End-Pumped Nd:YAG Laser with a Semiconductor Saturable Absorber Mirror Grown by Metal Organic Chemical Vapour Deposition

Chinese Physics Letters

Volumn 20, Issue 11, 2003, Pages 1960-1962

  Wang, Yong Gang ^a   Ma, Xiao Yu ^a   Li, Chun Yong ^b   Zhang, Zhi Guo ^b   Zhang, Bing Yuan ^c,d   Zhang, Zhi Gang ^c  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b INSTITUTE OF PHYSICS   (China)

^c BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^d LIAOCHENG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

LASER MIRRORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NEODYMIUM LASERS; OPTICAL PUMPING; ORGANIC CHEMICALS; ORGANOMETALLICS; PULSE REPETITION RATE; SEMICONDUCTOR LASERS; TEMPERATURE; YTTRIUM ALUMINUM GARNET;

A: SEMICONDUCTORS; DIODE END-PUMPED; LOWS-TEMPERATURES; METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS; MODE-LOCKED; ND:YAG LASER; PASSIVELY MODE-LOCKED; PULSE DURATIONS; RECOVERY TIME; REPETITION RATE;

SEMICONDUCTOR SATURABLE ABSORBER MIRRORS;

EID: 0242575845     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/20/11/016     Document Type: Article

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