Cross-linked PMMA as a low-dimensional dielectric sacrificial layer

Journal of Microelectromechanical Systems

Volumn 12, Issue 5, 2003, Pages 641-648

  Teh, W H ^a   Liang, Chi Te ^b   Graham, Mark ^c   Smith, Charles G ^a,c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c Cavendish Kinetics Ltd   (Netherlands)

Author keywords

Cross linked PMMA; Dielectric materials; Electron beam lithography; Quantum dot devices; Surface nanomachining; Titanium

Indexed keywords

DIELECTRIC MATERIALS; ELASTIC MODULI; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; TEMPERATURE;

ELECTRON BEAM IRRADIATION; NANOELECTROMECHANICAL SYSTEMS; NANOMACHINING FABRICATION PROCESS; SUBMICROMETER;

MICROELECTRONIC PROCESSING;

EID: 0242551735     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.817891     Document Type: Article

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