Calibration of MEMS strain sensors fabricated on silicon: Theory and experiments

Journal of Microelectromechanical Systems

Volumn 12, Issue 5, 2003, Pages 720-727

  Hautamaki, Charles ^a   Cao, Li ^b   Zhou, Jia ^a   Mantell, Susan C ^a   Kim, Tae Song ^c  

^a University of Minnesota   (United States)

^b Iowa State University   (United States)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

Calibration; Gauge factor; Sensor geometry

Indexed keywords

CALIBRATION; MICROSENSORS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; STRAIN GAGES; THICKNESS CONTROL;

GAUGE FACTOR; SENSOR GEOMETRY; STRAIN SENSORS; STRAIN TRANSFER;

MICROELECTROMECHANICAL DEVICES;

EID: 0242551731     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.817887     Document Type: Article

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