Tetragonal WSi2 formation by 0.5-5 MeV Xe-ion-beam irradiation at 250 °C and 450 °C

Journal of Applied Physics

Volumn 81, Issue 5, 1997, Pages 2219-2228

  Yamaguchi, Toru ^a   Nakata, Jyoji ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242527051     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364272     Document Type: Article

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