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Volumn , Issue , 2003, Pages 440-443

Plasma chemical reaction for nitric oxide and sulfur dioxide removal in corona discharge reactor

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ATMOSPHERIC PRESSURE; CLEANING; ELECTRIC DISCHARGES; LOW TEMPERATURE EFFECTS; NITROGEN OXIDES; SULFUR DIOXIDE; WATER;

EID: 0242494292     PISSN: 00849162     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (10)

References (6)
  • 1
    • 0004703658 scopus 로고
    • Environment of electron beam denitrazation processes by means of electric field
    • S. Masuda, M. Hirano and K. Akutsu, "Environment of electron beam denitrazation processes by means of electric field", Radiat. Phys. Chem., vol. 17, pp.233, 1981.
    • (1981) Radiat. Phys. Chem. , vol.17 , pp. 233
    • Masuda, S.1    Hirano, M.2    Akutsu, K.3
  • 3
    • 0037079657 scopus 로고    scopus 로고
    • Modeling of pulsed corona discharge process for the removal of nitric oxide and sulfur dioxide
    • Y. S. Mok, I. S. Nam "Modeling of pulsed corona discharge process for the removal of nitric oxide and sulfur dioxide", Chemical Engineering Journal, vol.85, pp. 87-97, 2002.
    • (2002) Chemical Engineering Journal , vol.85 , pp. 87-97
    • Mok, Y.S.1    Nam, I.S.2
  • 5
    • 0032181382 scopus 로고    scopus 로고
    • Mathematical Analysis of Positive Pulse Corona Discharge Process Employed for Removal of Nitrogen Oxides
    • Y. S. Mok, S. W. Ham, and In-Sik Nam, "Mathematical Analysis of Positive Pulse Corona Discharge Process Employed for Removal of Nitrogen Oxides", IEEE Trans. On Plasma Sci., vol. 26, pp.1566-1573, 1998.
    • (1998) IEEE Trans. On Plasma Sci. , vol.26 , pp. 1566-1573
    • Mok, Y.S.1    Ham, S.W.2    Nam, I.-S.3
  • 6
    • 0034301954 scopus 로고    scopus 로고
    • Chemical kinetics of NO removal by pulsed corona discharge
    • I Ohandini and U Riedd, "Chemical kinetics of NO removal by pulsed corona discharge", J. Phys. D: Appl. Phys., vol.33, pp.2467-2474, 2000.
    • (2000) J. Phys. D: Appl. Phys. , vol.33 , pp. 2467-2474
    • Ohandini, I.1    Riedd, U.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.