Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 5, 2003, Pages 2089-2092

  Yu, Zhaoning ^a   Chen, Lei ^a   Wu, Wei ^a   Ge, Haixiong ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIOTECHNOLOGY; DIFFRACTION GRATINGS; DNA; FLUIDICS; GAS LASERS; LITHOGRAPHY; MOLECULES; NANOTECHNOLOGY; OPTICS; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

BIOANALYSIS; LINE EDGE ROUGHNESS; MICROFLUIDIC SYSTEMS; NANOIMPRINT TECHNOLOGY; NANOSCALE GRATINGS; SMOOTHING TECHNIQUES;

NANOSTRUCTURED MATERIALS;

EID: 0242425714     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1609471     Document Type: Article

References (10)

1. K. K. Lee, D. R. Lim, L. C. Kimerling, J. Shin, and F. Cerrina, Opt. Lett. 26, 1888 (2001).
2. G. Schneider, Appl. Phys. Lett. 73, 599 (1998).
3. D. Csontos and H. Q. Xu, Appl. Phys. Lett. 77, 2364 (2000).
4. N. Tsumita, J. Melngailis, A. M. Hawryluk, and H. I. Smith, J. Vac. Sci. Technol. 19, 1211 (1981).
5. W. H. Juan and S. W. Pang, J. Vac. Sci. Technol. B 14, 4080 (1996).
6. F. Ren, S. J. Pearton, J. R. Lothian, C. R. Abernathy, and W. S. Hobson, J. Vac. Sci. Technol. B 10, 2407 (1992).
7. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
8. H. Cao, Z. Yu, J. Wang, J. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, Appl. Phys. Lett. 81, 174 (2002).
9. N. Namatsu, M. Nagase, T. Yamaguchi, K. Yamazuki, and K. Kurihara, J. Vac. Sci. Technol. B 16, 3315 (1998).
10. R. A. Wind and M. A. Hines, Surf. Sci. 460, 21 (2000).