Optical and Structural Properties of Tantalum-Oxide Thin Films Prepared by Using Reactive DC Magnetron Sputtering with Ar and O2 Mixed-Gas Ion-Beam Assistance

Journal of the Korean Physical Society

Volumn 43, Issue 4 II, 2003, Pages 616-620

  Kim, Sung Hwa ^a   Hwangbo, Chang Kwon ^a   Lee, Kwang Su ^b  

^a Inha University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Ion beam assited reactive magnetron sputtering; Optical properties; Tantalum oxide

Indexed keywords

EID: 0242381943     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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