Critical analysis of matching schemes in capacitively coupled discharges

IEEE Transactions on Plasma Science

Volumn 31, Issue 5 II, 2003, Pages 1100-1102

  Demokan, O ^a  

^a MIDDLE EAST TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Capacitive coupling; Gas discharges; Plasma impedance; Power matching; Radio frequency (RF) discharges; Sheaths

Indexed keywords

CAPACITANCE; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRIC IMPEDANCE; INTEGRATED CIRCUIT LAYOUT; PLASMA SHEATHS; PLASMAS; POISSON EQUATION; POWER INTEGRATED CIRCUITS;

CRITICAL ANALYSIS; GAS DISCHARGES; PLASMA IMPEDANCE; POWER MATCHING; RADIO FREQUENCY DISCHARGES;

ELECTRIC DISCHARGES;

EID: 0242323720     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.815480     Document Type: Article

References (4)

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2. H. U. Eckert, Proceedings of the Second International Conference on Plasma Chemistry and Technology. Lancaster, PA: Technomic, 1986.
3. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994, ch. 11.
4. O. A. Popov and V. A. Godyak, "Power dissipated in low-pressure radio-frequency discharge plasmas," J. Appl. Phys., vol. 57, no. 1, pp. 53-58, 1985.