Three-dimensional wafer process model for nanotopography

Materials Research Society Symposium - Proceedings

Volumn 767, Issue , 2003, Pages 3-8

  Yoshida, Takafumi ^a  

^a YNT jpCom   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY ELEMENT METHOD; CHEMICAL MECHANICAL POLISHING; CRYSTALLOGRAPHY; FINITE ELEMENT METHOD; PLASTIC DEFORMATION; SURFACE TOPOGRAPHY; WSI CIRCUITS;

NANOTOPOGRAPHY;

NANOTECHNOLOGY;

EID: 0242322670     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-767-f1.1     Document Type: Conference Paper

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