New Plasma Source for Assisted Reactive Evaporation and IBAD Applications

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 504-509

  Madocks, J ^a  

^a Applied Process Technologies Inc   (United States)

Author keywords

Ion source; Ion assisted deposition; Plasma source; Reactive deposition

Indexed keywords

DENSIFICATION; EVAPORATION; ION BEAM ASSISTED DEPOSITION; MAGNETIC FIELD EFFECTS; MAGNETOPLASMA; OPTICAL COATINGS; OPTICAL FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

ION DENSIFICATION;

PLASMA SOURCES;

EID: 0242322058     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. Kaufman, H.R., Robinson, R.S., "Ion Source Design for Industrial Applications," AIAA Journal, Vol. 20, No. 6, June 1982.
2. Kaufman, H.R., et al., "End Hall Ion Source," US Patent No. 4,862,032, August 29, 1989.
3. Anonymous, "APS Advanced Plasma Source," Sales Brochure, Leybold Optics, GmbH, www.leyboldoptics.com.
4. J.L. Vossen and W. Kern editors, Thin Film Processes, Academic Press, Inc., 1978, page 50.
5. J. Madocks, "New Magnetically Enhanced Source for High Rate PECVD," Association of Industrial Metalizers, Coaters and Laminators, Annual Conference Proceedings 2002.
6. Reference endnote 5.