Epitaxial [formula omitted] films grown by pulsed laser deposition and reactive ion beam sputtering techniques

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 2734-2739

  Adachi, N ^a   Denysenkov, V P ^a   Khartsev, S I ^a   Grishin, A M ^a   Okuda, T ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; DEPOSITION RATES; FERROMAGNETIC RESONANCE; GADOLINIUM COMPOUNDS; GALLIUM COMPOUNDS; IRON; IRON COMPOUNDS; LASER OPTICS; MAGNETIC ANISOTROPY; PULSED LASER DEPOSITION; PULSED LASERS; SATURATION MAGNETIZATION; SINGLE CRYSTALS; SPUTTERING; TEXTURES; X RAY DIFFRACTION ANALYSIS;

COMPARATIVE CHARACTERIZATIONS; EPITAXIAL RELATIONSHIPS; FERROMAGNETIC RESONANCE MEASUREMENTS; GYROMAGNETIC RATIO; HIGH DEPOSITION RATES; MAGNETO-OPTIC APPLICATIONS; REACTIVE ION BEAM SPUTTERING; UNIAXIAL MAGNETIC ANISOTROPY;

ION BEAMS;

EID: 0242273907     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.1287227     Document Type: Article

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