A high gravity chemical vapor deposition apparatus

Review of Scientific Instruments

Volumn 68, Issue 11, 1997, Pages 4225-4231

  Abe, Yoshiyuki ^a   Maizza, Giovanni ^a,c   Sone, Noboru ^b   Nagasaka, Yuji ^b   Suzuki, Tetsuya ^b  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b KEIO UNIVERSITY   (Japan)

^c POLITECNICO DI TORINO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0142255313     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148336     Document Type: Article

References (16)

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