A novel coplanar amorphous silicon thin-film transistor using suicide layers

IEEE Electron Device Letters

Volumn 20, Issue 1, 1999, Pages 33-35

  Kim, Sung Ki ^a  

^a Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0142196474     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.737565     Document Type: Article

References (2)

1. P. G. LeComber, W. E. Spear, and A. Gaith, "Amorphous-silicon field-effect device and possible application," Electron. Lett., vol. 15, pp. 179-181, 1979.
2. F. Richou, F. Morin, M. Le Contellec, and A. Prolonge, "The 2s TFT process for low-cost AMLCD manufacturing," Dig. Soc. Inform. Display, pp. 619-622, 1992.