Synthesis and characterization of radiation-curable monomers for antistatic coatings

Progress in Organic Coatings

Volumn 48, Issue 1, 2003, Pages 34-42

  Kim, H K ^a   Kim, Y B ^b   Cho, J D ^a   Hong, J W ^a  

^a Chosun University   (South Korea)

^b Q Sys Co Ltd   (South Korea)

Author keywords

Antistatic monomer; FTIR ATR; Near IR; Photo DSC; Radiation curable; Surface resistance

Indexed keywords

ANTISTATIC AGENTS; CALORIMETRY; CURING; ELECTRIC RESISTANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; MONOMERS; PHOTOPOLYMERIZATION; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL);

STAIN RESISTANCE;

ORGANIC COATINGS;

EID: 0142106974     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0300-9440(03)00093-6     Document Type: Article

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