Study on intrinsic stress of nc-Si:H film

Gongneng Cailiao yu Qijian Xuebao/Journal of Functional Materials and Devices

Volumn 9, Issue 3, 2003, Pages 285-

  Wei, Wen Sheng ^a   Wang, Tian Min ^a   Zhang, Chun Xi ^a   Li, Guo Hua ^a   Han, He Xiang ^a   Ding, Kun ^a  

^a NONE

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EID: 0142090167     PISSN: 10074252     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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