Performance of the magnetron sputtering apparatus equipped with 60 mmø superconducting bulk magnet

Superconductor Science and Technology

Volumn 16, Issue 10, 2003, Pages 1207-1211

  Mizutani, U ^a   Hazama, H ^b   Matsuda, T ^c   Itoh, Y ^d   Ikuta, H ^a   Sakurai, K ^e   Imai, A ^f  

^a NAGOYA UNIVERSITY   (Japan)

^b NIIGATA UNIVERSITY   (Japan)

^c DIAX Co Ltd   (Japan)

^d Aisin Cosmos R and D Co   (Japan)

^e ANELVA Corp ^*  (Japan)

^f NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ELECTRIC FIELDS; MAGNETIC DOMAINS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; PERFORMANCE; SURFACES; SYNTHESIS (CHEMICAL);

OXYGEN-CONTROLLED MELT-GROWN METHOD; TARGET-TO-SUBSTRATE DISTANCE;

SUPERCONDUCTING MAGNETS;

EID: 0142056085     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/16/10/314     Document Type: Article

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